photomask

Each of the physical masks generated from this data is called a photomask.

Exposure systems typically produce an image on the wafer using a photomask.

The sample is then placed underneath the photomask, and pressed into "contact" against it.

This is necessary for the layers to be defined for photomask production.

Print onto transparent film and use as photomask along with photo-sensitized boards.

A proximity printer puts a small gap between the photomask and wafer.

The emergence of immersion lithography has a strong impact on photomask requirements.

Thus the pattern may be transferred from the photomask to a sample, in the form of photo-sensitive resist.

A single photomask may be used many times to repeatably reproduce a pattern onto different substrates.

When this testing is complete the photomask information is released for chip fabrication.

These systems are also used in semiconductor imaging applications, including photomask generation and wafer inspection.

The photomask is placed between the UV light source and the photosensitive fiber.

The variation of electron beam scattering in directly writing the photomask pattern can easily well exceed this.

In electronics, a photomask is a special stencil which is used to create a printed circuit board.

Pellicle, the protective cover which can be applied to a photomask used in semiconductor device fabrication.

In double patterning techniques, a photomask would correspond to a subset of the layer pattern.

The sample is "exposed", during which UV light is then shone from the top side of the photomask.

More specifically, the projection optics can only capture a limited spatial frequency spectrum from the object (photomask).

A photomask having the intended grating features may also be used in the manufacture of fiber Bragg gratings.

Photoengraving uses a photomask and developer to selectively remove a photoresist coating.

The light shines through the photomask, which blocks it in some areas and lets it pass in others.

A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern.

The least expensive method is a direct photomask, which provides 15 m resolution in resist 80 m thick.

Generally, a photomask is purchased/generated, which consists of opaque Chromium patterns on a transparent glass plate.

A series of chemical treatments then enables deposition of the protein in the desired pattern upon the material underneath the photomask.